Tokyo Electron 3Z39-000005-V1自動(dòng)匹配器 PDF資料
1.產(chǎn) 品 資 料 介 紹:
中文資料:
產(chǎn)品名稱
TEL Tokyo Electron 3Z39-000005-V1 自動(dòng)匹配器
產(chǎn)品類型
射頻自動(dòng)阻抗匹配器(RF Auto Matcher)
設(shè)備功能
該模塊用于 Tokyo Electron 半導(dǎo)體設(shè)備中,主要用于:
在高頻射頻系統(tǒng)中執(zhí)行自動(dòng)阻抗匹配
確保 RF 發(fā)射器與等離子體負(fù)載之間的阻抗最優(yōu)化
降低反射功率,提高能量耦合效率
保護(hù) RF 發(fā)射器、等離子腔體、匹配網(wǎng)絡(luò)等關(guān)鍵部件
典型應(yīng)用
適用于 Tokyo Electron 的刻蝕、CVD、ALD 等工藝系統(tǒng),通常與 Daihen 等品牌的射頻電源配套使用。常見于:
Clean Track 系統(tǒng)
真空腔體內(nèi)的等離子控制模塊
需要高速響應(yīng)的射頻控制場(chǎng)景
技術(shù)參數(shù)(可能對(duì)應(yīng) Daihen RMN-20K3-V)
工作頻率:13.56 MHz 或其他高頻工業(yè)標(biāo)準(zhǔn)
功率支持范圍:最多可達(dá) 20kW(具體視版本而定)
自動(dòng)控制:具備實(shí)時(shí)反饋匹配算法
接口標(biāo)準(zhǔn):工業(yè)標(biāo)準(zhǔn)射頻接口,可與 TEL 原廠或第三方 RF 系統(tǒng)集成
英文資料:
product name
TEL Tokyo Electron 3Z39-000005-V1 Automatic Matcher
product type
RF Auto Matcher
Equipment functions
This module is used in Tokyo Electron semiconductor equipment, mainly for:
Performing automatic impedance matching in high-frequency RF systems
Ensure optimal impedance between RF transmitter and plasma load
Reduce reflection power and improve energy coupling efficiency
Protect key components such as RF transmitters, plasma chambers, and matching networks
Typical applications
Suitable for etching, CVD, ALD and other process systems of Tokyo Electron, usually used in conjunction with RF power supplies from brands such as Daihen. Commonly seen in:
Clean Track System
Plasma control module inside the vacuum chamber
RF control scenarios that require high-speed response
Technical parameters (possibly corresponding to Daihen RMN-20K3-V)
Operating frequency: 13.56 MHz or other high-frequency industry standards
Power support range: up to 20kW (depending on version)
Automatic control: equipped with real-time feedback matching algorithm
Interface standard: Industrial standard RF interface, can be integrated with TEL original or third-party RF systems
2.產(chǎn) 品 展 示
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